Nanofabrication: Techniques and Principles

Maria Stepanova; Steven Dew (Editors)

Buku ini diterbitkan oleh Springer tahun 2012. Cakupan 344  halaman.

Daftar isi:

Part I  Introduction

• Directions in Nanofabrication, 3

 Part II  Nanolithography

• Fundamentals of Electron Beam Exposure and Development, 11
• Simulation of Electron Beam Exposure and Resist Processing for Nano-Patterning, 43
• Helium Ion Lithography, 93
• Nanoimprint Technologies, 117

 Part III Deposition at the Nanoscale

• Atomic Layer Deposition for Nanotechnology,143
• Surface Functionalization in the Nanoscale Domain, 163
• Nanostructures Based on Self-Assembly of Block Copolymers, 191
• Epitaxial Growth of Metals on Semiconductors Via Electrodeposition, 217

 Part IV Nanoscale Etching and Patterning

• Chemical Mechanical Polish for Nanotechnology, 239
• Deposition, Milling, and Etching with a Focused Helium Ion Beam, 275
• Laser Nanopatterning,  301
• Templating and Pattern Transfer Using Anodized Nanoporous Alumina/Titania, 321

Buku terkait:

 

 

 

 

Baca & Informasi lebih lanjut, hubungi:

PDII-LIPI SERPONG
Telp. 021-7560537
E-mail: pdiiserpong@yahoo.com